Microstructural and Electrochemical Properties of Ti-doped Al_2O_3 Coated LiCoO_2 Films
Microstructural and Electrochemical Properties of Ti-doped Al_2O_3 Coated LiCoO_2 Films
- 주제(키워드) encrgy storage materials , sputtering , electrochemistry , LiCoO2 , TiAlO coating
- 발행기관 대한금속·재료학회
- 발행년도 2011
- 총서유형 Journal
- UCI G704-000797.2011.17.4.017
- KCI ID ART001609203
- 본문언어 영어
초록/요약
We studied the microstructural and electrochemical properties of Ti-doped Al_2O_3 (Ti-Al_2O_3) coated LiCoO_2 thin films depending on the Ti composition. The 1.27 at.% Ti-Al_2O_3 coated films had an amorphous structure with better conductivity than that of pure Al2O3 films. The Ti-Al_2O_3 coating layer effectively suppressed the dissolution of Co and the formation of lower Li conductivity SEI films at the interface between the LiCoO_2 film and electrolyte. The Ti-Al_2O_3 coating improved the cycling performance and capacity retention at high voltage (4.5 V) of the LiCoO_2 films. The Ti-Al_2O_3 coated LiCoO_2 films showed better electrochemical properties than did the pure Al_2O_3 coated LiCoO_2 films. These results were closely related to the enhanced Li-conductivity and interfacial quality of the Ti-Al_2O_3 film.
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