Secondary Electron Generation in Electron-beam-irradiated Solids: Resolution Limits to Nanolithography
Secondary Electron Generation in Electron-beam-irradiated Solids: Resolution Limits to Nanolithography
- 주제(키워드) Electron-beam nanolithography , Secondary electron generation , Monte Carlo simulation
- 발행기관 한국물리학회
- 발행년도 2009
- 총서유형 Journal
- UCI G704-000411.2009.55.4.015
- KCI ID ART001498041
- 본문언어 영어
초록/요약
We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5 ― 10 nm, setting limits to the nanolithographic resolution.
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