열처리 분위기에 따른 유로퓸 실리케이트 박막의 특성 변화 : Property Changes of Europium-Silicate Thin Films depending on the Ambient Gas
Property Changes of Europium-Silicate Thin Films depending on the Ambient Gas
- 주제(키워드) Europium silicate , RF-sputtering , Rapid thermal annealing , Photoluminescence , Europium silicate , RF-sputtering , Rapid thermal annealing , Photoluminescence
- 발행기관 한국전기전자재료학회
- 발행년도 2007
- 총서유형 Journal
- UCI G704-000026.2007.20.3.011
- KCI ID ART001192554
초록/요약
We investigate the influence of the ambient gas during thermal annealing on the photoluminescence (PL) properties of europium-silicate thin films. The films were fabricated on substrates by using a radio-frequency magnetron sputtering method and subsequent rapid thermal annealing (RTA). The mechanism for the formation of the europium silicates during the annealing process was investigated by using X-ray diffraction (XRD) spectroscopy, Auger electron spectroscopy (AES) and transmission electron microscopy (TEM). A series of narrow PL spectra from Eu3+ ions was observed from the film annealed in O2 ambient. Broad PL spectra associated with Eu2+ ions, with a maximum intensity at 600 nm and a FWHM of 110 nm, were observed from the thin film annealed at 1000 ℃ in N2 ambient.
more