Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application
Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application
- 발행기관 한국화학공학회
- 발행년도 2006
- 총서유형 Journal
- UCI G704-000406.2006.23.2.025
- KCI ID ART001118987
