Hydrogenated Nanocrystalline Silicon Thin Films Deposited by Rf-Magnetron Sputtering
Hydrogenated Nanocrystalline Silicon Thin Films Deposited by Rf-Magnetron Sputtering
- 주제(키워드) Nanostructures , Silicon , SputteringI
- 발행기관 한국물리학회
- 발행년도 2004
- 총서유형 Journal
- UCI G704-000411.2004.45.3.112
- KCI ID ART001194993
- 본문언어 영어
초록/요약
Nanocrystals are formed in hydrogenated, metal-catalyzed, and recrystallized silicon thin lms deposited by rf-magnetron sputtering. The nanocrystals grow in di erent environments and show various sizes and distributions : L = 3 8 nm for the hydrogenated silicon, L = 30 70 nm for the metal-catalyzed silicon, and undetermined for the recrystallized silicon (i.e., due to the extremely limited line width compared to instrumental line width). Their sizes are scaled below 20 nm by Raman spectra but extend above 20 nm by X-ray di raction lines. The size of nanocrystals in the hydrogenated silicon is also con rmed by measurements by transmission electron microscopy.
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